| 浅谈二氧化硅消光粉 |
| 添加时间：2017/9/20 17:37:19 浏览次数： |
| 不含消光剂的清漆涂膜呈镜膜流平状态，当光到达镜膜表面时，入射光部分被吸收，部分被反射，反射部分使膜呈现光泽。含有白炭黑消光剂的漆膜，均匀分布于漆膜中的白炭黑粒子形成一种微粗糙面。 Varnish without matting is in a state of flat film. When the light reaches the surface of the mirror film, the incident light is absorbed and partly reflected, and the reflecting part gives the film a gloss. A paint film containing white carbon matting agent; a white carbon particle uniformly distributed in the paint film to form a micro rough surface. 漆膜表面微小的凹凸可使光线形成漫反射。 Small asperities on the surface of the film make the light diffuse. 溶剂的挥发：在湿膜内形成指向漆膜表面运动的“溪流”，带动消光剂颗粒向表面定向聚集的过程。 Volatilization of solvent: a stream in the wet film that points to the surface of the paint film and drives the matting of the matting agent particles to the surface. 消光方式的选择 Selection of extinction mode 体系的不相容 Incompatibility of the system 高填料 High filling 蜡粉 Wax powder 有机消光剂：PMMA-PS复合微粒 Organic matting agent: PMMA-PS composite particles 无机消光剂 Inorganic matting agent 无机消光剂 Inorganic matting agent 白炭黑，气相二氧化硅，沉淀法二氧化硅 Fumed silica, fumed silica, precipitated silica 表面处理及未表面处理，亲疏水 Surface treatment and surface treatment, hydrophobic 具有更大的比表面积与特殊的晶型结构 Having a larger specific surface area and a special crystalline structure 微观结构是无定形或呈玻璃态，与天然二氧化硅相比，白炭黑的二氧化硅纯度高、惰性大、耐紫外光，折光指数为1.46 The microstructure is amorphous or glassy. Compared with natural silica, silica has high purity, inertness, UV resistance and refractive index of 1.46 气相法白炭黑 Fumed silica 气相法白炭黑：最早1941年DEGUSSA所开发，化学气相沉积法，是由四氯化硅蒸气在氢氧气氛下高温水解形成气凝胶，通过聚集器聚集成较大颗粒后进行收集，其反应式如下： Fumed silica: as early as 1941 DEGUSSA developed by chemical vapor deposition method, is composed of four silicon tetrachloride vapor in hydrogen atmosphere at high temperature formed by the hydrolysis of the aerogel collector, collected through the agglomerate into larger particles, the reaction is as follows: SiCl4+2H2+O2------->SiO2+4HCl 1800℃ SiCl4+2H2+O2------->SiO2+4HCl 1800 DEG C 沉淀法白炭黑 precipitated silica 用酸（通常使用硫酸）对硅酸钠溶液（水玻璃）进行中和，过滤去除副产物，对剩下的白炭黑进行干燥，疏松，絮状结构；此法最大比表面可达500m2/g Neutralization of the sodium silicate solution (water glass) with acid (usually sulfuric acid), filtration, removal of by-products, drying of the remaining silica, a loose, flocculent structure; the maximum specific surface of this process is up to 500m2/g 应用性能由沉淀阶段（成份、配比、时间、温度和浓度）中形成的微观粒子结构决定。 The application performance is determined by the microscopic particle structure formed in the precipitation stage (composition, ratio, time, temperature and concentration). 凝胶法白炭黑 Gel silica 原料工艺路线与沉淀法接近，不同在于酸碱反应经过溶胶-凝胶过程，但产品特性与气相法较为类似。 The process route of raw material is close to that of precipitation process. The difference is that the acid base reaction is through sol-gel process, but the product characteristics are similar to those of gas phase method. 瓦克（WACKER）：N20、T40、H15、H13L、H20、H17、H18、H2000 Wacker (WACKER): N20, T40, H15, H13L, H20, H17, H18, H2000 德固赛（DEGUSSA）亲水性：A200、A300、A380,TT Degussa (DEGUSSA): A200, A300, hydrophilic A380, TT 德固赛（DEGUSSA）疏水性：R972、R974、R202、R812、R812S、R106、R8200 Degussa (DEGUSSA): R972, R974, hydrophobic R202, R812, R812S, R106, R8200 CABOT（卡博特）：M-5、EH-5、TS-720、TS-610 CABOT (Cabot): M-5, EH-5, TS-720, TS-610 TOKUYAMA（德山）：QS-102、QS-20、QS-40、DM-10 TOKUYAMA (Tokuyama): QS-102, QS-20, QS-40, DM-10 吉必盛气相二氧化硅：H-200、H-150 Kyrgyzstan Bisheng silica: H-200, H-150 消光度的影响因素 Factors affecting the degree of extinction 1、消光粉的平均粒径及分布 1. Average particle size and distribution of matting powder 2、孔隙率 2 porosity 3、堆积密度 3, bulk density 4、表面处理 4, surface treatment 5、使用的方法 5, the use of methods 6、干燥条件 6. Drying conditions 7、涂层厚度 7 coating thickness 8、混合体系 8, mixed system 一般消光规律 General extinction law 一般来说, 消光粉的平均粒径越大，消光效率就会越高 Generally speaking, the larger the average particle size of extinction powder, the higher the extinction efficiency 如有大量“粗”“细”粒子，即分布不均，造成增粘及过度粗糙 If a large number of "coarse" "fine" particles, that is uneven distribution, resulting in thickening and excessive roughness 消光粉的孔隙率越高，单位重量粉料含量就会越高 The higher the porosity of the extinction powder, the higher the unit weight and powder content 光泽的降低是粒子的粒径效应 The decrease in gloss is the particle size effect of particles 同等粒径，高孔隙率效果效果越好 The same size, high porosity, the better the effect 堆积密度与消光性能无直接联系 There is no direct relation between bulk density and extinction performance 颗粒小，堆积密度小，孔隙率大，比表面大，吸油量相应增大 Small particles, small accumulation density, large porosity, larger than the surface, oil absorption increased accordingly 吸油量大一般消光性能好些 Large oil absorption, general extinction performance better 表面处理的消光性能更好 Surface treatment has better extinction performance 红外解析 Infrared analysis 1095 cm-1 强而宽的吸收带是Si-O-Si 反对称伸缩振动峰， 806 cm-1、476 cm-1 处的峰为Si-O 键对称伸缩振动峰， The strong and broad absorption band of 1095 cm-1 is Si-O-Si antisymmetric stretching vibration peak, and the peak at 806 cm-1 and 476 cm-1 is the symmetric stretching vibration peak of Si-O bond, 3442 cm-1 处的宽峰是结构水-OH 反对称伸缩振动峰， The wide peak at 3442 cm-1 is the structural water -OH antisymmetric stretching vibration peak, 1636 cm-1附近是水的H-O-H 弯曲振动峰， Near 1636 cm-1 is the H-O-H flexural vibration peak of water, 955 cm-1 处的峰属于Si-OH 的弯曲振动吸收峰。 The peaks at 955 cm-1 belong to the flexural vibration absorption peak of Si-OH. |
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