不含消光剂的清漆涂膜呈镜膜流平状态，当光到达镜膜表面时，入射光部分被吸收，部分被反射，反射部分使膜呈现光泽。含有白炭黑消光剂的漆膜，均匀分布于漆膜中的白炭黑粒子形成一种微粗糙面。

Varnish without matting is in a state of flat film. When the light reaches the surface of the mirror film, the incident light is absorbed and partly reflected, and the reflecting part gives the film a gloss. A paint film containing white carbon matting agent; a white carbon particle uniformly distributed in the paint film to form a micro rough surface.

漆膜表面微小的凹凸可使光线形成漫反射。

Small asperities on the surface of the film make the light diffuse.

溶剂的挥发：在湿膜内形成指向漆膜表面运动的“溪流”，带动消光剂颗粒向表面定向聚集的过程。

Volatilization of solvent: a stream in the wet film that points to the surface of the paint film and drives the matting of the matting agent particles to the surface.

消光方式的选择

Selection of extinction mode

体系的不相容

Incompatibility of the system

高填料

High filling

蜡粉

Wax powder

有机消光剂：PMMA-PS复合微粒

Organic matting agent: PMMA-PS composite particles

无机消光剂

Inorganic matting agent

无机消光剂

Inorganic matting agent

白炭黑，气相二氧化硅，沉淀法二氧化硅

Fumed silica, fumed silica, precipitated silica

表面处理及未表面处理，亲疏水

Surface treatment and surface treatment, hydrophobic

具有更大的比表面积与特殊的晶型结构

Having a larger specific surface area and a special crystalline structure

微观结构是无定形或呈玻璃态，与天然二氧化硅相比，白炭黑的二氧化硅纯度高、惰性大、耐紫外光，折光指数为1.46

The microstructure is amorphous or glassy. Compared with natural silica, silica has high purity, inertness, UV resistance and refractive index of 1.46

气相法白炭黑

Fumed silica

气相法白炭黑：最早1941年DEGUSSA所开发，化学气相沉积法，是由四氯化硅蒸气在氢氧气氛下高温水解形成气凝胶，通过聚集器聚集成较大颗粒后进行收集，其反应式如下：

Fumed silica: as early as 1941 DEGUSSA developed by chemical vapor deposition method, is composed of four silicon tetrachloride vapor in hydrogen atmosphere at high temperature formed by the hydrolysis of the aerogel collector, collected through the agglomerate into larger particles, the reaction is as follows:

SiCl4+2H2+O2------->SiO2+4HCl    1800℃

SiCl4+2H2+O2------->SiO2+4HCl 1800 DEG C

沉淀法白炭黑

precipitated silica

用酸（通常使用硫酸）对硅酸钠溶液（水玻璃）进行中和，过滤去除副产物，对剩下的白炭黑进行干燥，疏松，絮状结构；此法最大比表面可达500m2/g

Neutralization of the sodium silicate solution (water glass) with acid (usually sulfuric acid), filtration, removal of by-products, drying of the remaining silica, a loose, flocculent structure; the maximum specific surface of this process is up to 500m2/g

应用性能由沉淀阶段（成份、配比、时间、温度和浓度）中形成的微观粒子结构决定。

The application performance is determined by the microscopic particle structure formed in the precipitation stage (composition, ratio, time, temperature and concentration).

凝胶法白炭黑

Gel silica